New SiComb publication in Materials!

We are pleased to inform you that our article "Wet-Oxidation-Assisted Chemical Mechanical Polishing and High-Temperature Thermal Annealing for Low-Loss 4H-SiC Integrated Photonic Devices" has been published in Materials as part of the Special Issue Structural, Morphological, and Optical Properties of Functional Thin Films and is available online!

Silicon carbide (SiC) has become a promising optical material for quantum photonics and nonlinear photonics during the past decade. In this work, we propose two methods to improve the 4H-SiC thin film quality for SiC-integrated photonic chips.

We experimentally demonstrate that the wet-oxidation-assisted CMP and the high-temperature annealing can effectively increase the intrinsic quality factor of the 4H-SiC optical microring resonators.

Thanks to Xiaodong Shi (DTU), Yaoqin Lu (DTU), Didier Chaussende (CNRS), Karsten Rottwitt (DTU), and Haiyan Ou (DTU) for their contribution.

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